• DocumentCode
    2525588
  • Title

    A low driving voltage CCD with single layer electrode structure for area image sensor

  • Author

    Tanaka, N. ; Nakamura, N. ; Matsunaga, Y. ; Manabe, S. ; Yoshida, O.

  • Author_Institution
    ULSI Res. Center, Toshiba Corp., Kawasaki, Japan
  • fYear
    1994
  • fDate
    11-14 Dec. 1994
  • Firstpage
    705
  • Lastpage
    708
  • Abstract
    A single layer electrode two-phase CCD is studied for the purpose of obtaining low power consumption interline-transfer CCD(IT-CCD) image sensor. The CCD has both a storage region under a thick gate oxide and a barrier region under a thin gate oxide for each transfer electrode. In order to attain high charge transfer efficiency for an extremely low driving voltage below 2 V, a new alignment-deviation-free structure and a potential pocket suppression structure are introduced. A 1/3 inch format 270 K pixel IT-CCD image sensor with the horizontal CCD driving voltage of 1.8 V is developed by employing the single layer electrode structure for the first time. The four-phase vertical CCDs also have the single layer electrode structure. The single layer electrode structure is very useful for vertical scale-down which is indispensable for the chip size shrinking.<>
  • Keywords
    CCD image sensors; power consumption; area image sensor; barrier region; interline-transfer; low driving voltage CCD; pocket suppression structure; single layer electrode structure; thick gate oxide; two-phase CCD; Boron; Charge coupled devices; Charge transfer; Degradation; Electrodes; Energy consumption; Image sensors; Image storage; Low voltage; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1994. IEDM '94. Technical Digest., International
  • Conference_Location
    San Francisco, CA, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-2111-1
  • Type

    conf

  • DOI
    10.1109/IEDM.1994.383316
  • Filename
    383316