Title :
Improvement on the Property of TiO2 Films due to Plasma Processing
Author :
Murata, H. ; Sakamaki, T. ; Yoshizawa, A. ; Uwatoko, M. ; Kogoshi, S.
Author_Institution :
Tokyo Univ. of Sci., Chiba
Abstract :
TiO2 films are known to be effective as a photo-catalyst for abatement of NOx and volatile organic compounds. However, they can´t normally be activated with visible rays. The TiO2 films have been processed by hydrogen or nitrogen plasma in order to absorb some of visible rays. The abatement experiments of NOx and HCHO using the TiO2 films were carried out. The results showed that the reduction rate of NOx by the hydrogen plasma processed TiO2 film was higher than that of the nitrogen plasma processed one by 1.1 times and that of no processed one by 1.7 times when using a chemical lamp and by more than 10 times when using an ordinary fluorescent lamp, which suggests that the plasma processed TiO 2 films are activated with visible rays
Keywords :
metallic thin films; plasma materials processing; plasma sources; titanium compounds; TiO2; chemical lamp; hydrogen plasma; nitrogen plasma; plasma processed films; plasma processing; Fluorescent lamps; Hydrogen; Plasma chemistry; Plasma density; Plasma materials processing; Plasma properties; Plasma sources; Plasma waves; Sputtering; Surface waves;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 2006. ISDEIV '06. International Symposium on
Conference_Location :
Matsue
Print_ISBN :
1-4244-0191-7
Electronic_ISBN :
1093-2941
DOI :
10.1109/DEIV.2006.357366
