Title :
Fabrication of a thin film micro polarization array
Author :
Gruev, Viktor ; Wu, Kejia ; Van der Spiegel, Jan ; Engheta, Nader
Author_Institution :
Dept. of Electr. & Syst. Eng., Pennsylvania Univ., Philadelphia, PA
Abstract :
A thin film polarizer has been patterned and etched using reactive ion etching (RIE) in order to create 14 micron circular periodic structures. The polarization thin film has extinction ratio of 60dB in the blue and green visible spectrum and ~40db in the red spectrum. Various gas combinations for RIE has been explored and it has been experimentally determined that for a particular concentration of CF4 and O2 an optimum etching rate, in terms of speed and under-etching, is possible. Theoretical explanation for the optimum etching rate has been also presented. In addition, anisotropic etching with less then 0.5mum under cutting has been achieved. Experimental results of the patterned structures under polarized light are presented
Keywords :
carbon compounds; light polarisation; optical polarisers; oxygen; sputter etching; thin film devices; anisotropic etching; blue visible spectrum; circular periodic structures; green visible spectrum; optimum etching rate; polarization thin film; reactive ion etching; red spectrum; thin film micropolarization array; thin film polarizer; Biology computing; Data mining; Etching; Fabrication; Filters; Optical polarization; Polymers; Sensor arrays; Stokes parameters; Transistors;
Conference_Titel :
Circuits and Systems, 2006. ISCAS 2006. Proceedings. 2006 IEEE International Symposium on
Conference_Location :
Island of Kos
Print_ISBN :
0-7803-9389-9
DOI :
10.1109/ISCAS.2006.1692559
