DocumentCode
2532009
Title
Fabrication of magnetic nanostructures using KrF lithography
Author
Singh, Navab ; Goolaup, S. ; Adeyeye, A.O.
Author_Institution
Inst. of Microelectron., Singapore, Singapore
fYear
2004
fDate
16-19 Aug. 2004
Firstpage
65
Lastpage
67
Abstract
We have developed a large area nanofabrication technique for synthesizing nanomagnetic arrays based on KrF lithographic exposure tool. Using phase shift mask technique and resist trimming, we have fabricated array of complex nanomagnetic structures with dimensions well below the resolution limit of the conventional optical lithography. Magnetic nanostructures of different shapes, complexities and sizes down to 50 nm displaying novel properties have been fabricated using a lift off method.
Keywords
electron beam deposition; ferromagnetic materials; iron alloys; magnetic thin films; nanostructured materials; nanotechnology; nickel alloys; phase shifting masks; photolithography; resists; KrF lithography; NiFe; lift off method; magnetic nanostructures; nanofabrication technique; nanomagnetic arrays; optical lithography; phase shift mask technique; resist trimming; Drives; Electron beams; Etching; Fabrication; Microelectronics; Milling; Resists; Semiconductor nanostructures; Shape; X-ray lithography;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology, 2004. 4th IEEE Conference on
Print_ISBN
0-7803-8536-5
Type
conf
DOI
10.1109/NANO.2004.1392251
Filename
1392251
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