DocumentCode :
2538366
Title :
New device models of quantum well infrared photodetectors
Author :
Pan, J.L.
Author_Institution :
Yale Univ., New Haven, CT, USA
fYear :
2000
fDate :
19-21 June 2000
Firstpage :
47
Lastpage :
48
Abstract :
Summary form only given. Recent numerical work (Ershov et al, 1997; Thibaudeau et al, 1996) has shown that at low operating temperatures or large incident photon fluxes, carriers deplete from the quantum wells near the emitter contact in a quantum well infrared photodetector (QWIP). This work finds a physical model (with closed form analytical expressions) which explains the recent numerical work on carrier depletion in QWIPs. The physical model found in this work is computationally much less intensive than the full numerical model, but retains the essential physics. As an example, we have considered device designs with the same periodic structure (the same compositions and layer widths) throughout the QWIP. In our physical model, the incident radiative flux was fixed, while the device behavior was studied for a varying applied bias. The current was seen to rise linearly with the applied bias in the different operating regimes, but with a different differential resistance in each operating regime. The physics behind this device characteristic was studied, and results are summarized here.
Keywords :
electric current; electric resistance; infrared detectors; quantum well devices; semiconductor device models; semiconductor quantum wells; QWIP; applied bias; carrier depletion; device behavior; device characteristic; device composition; device design; device models; device physics; differential resistance; emitter contact; incident photon flux; incident radiative flux; layer width; linear current rise; numerical analysis; numerical model; operating regimes; operating temperature; periodic structure; quantum well infrared photodetectors; quantum wells; Capacitors; Electron mobility; Equations; Numerical models; Photoconductivity; Photodetectors; Physics computing; Temperature; Thermionic emission; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2000. Conference Digest. 58th DRC
Conference_Location :
Denver, CO, USA
Print_ISBN :
0-7803-6472-4
Type :
conf
DOI :
10.1109/DRC.2000.877082
Filename :
877082
Link To Document :
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