DocumentCode :
2538850
Title :
Hot electrons and time-to-breakdown induced degradation in AlGaN/GaN HEMTs
Author :
Zanoni, Enrico ; Meneghini, Matteo ; Meneghesso, Gaudenzio
Author_Institution :
Dept. of Inf. Eng., Univ. of Padova, Padova, Italy
Volume :
2
fYear :
2012
fDate :
21-23 May 2012
Firstpage :
593
Lastpage :
598
Abstract :
This paper reports on the experimental evidences of hot electrons induced degradations of AlGaN/GaN HEMTs submitted to on-state stress tests. Thanks to the use of a combined electrical and electroluminescence characterization we demonstrate that: (a) exposure of devices to on-state stress can induce a remarkable decrease in drain current; (b) drain current degradation is due to electron trapping induced by hot electrons in the gate-drain access region; (c) degradation rate strongly depends on the intensity of the EL signal emitted by the devices during stress, while it has a negligible dependence on temperature. Finally, we derived an accelerated degradation law for GaN HEMT submitted to accelerated bias test, by using the intensity of the EL signal as a measure of the stress acceleration factor.
Keywords :
III-V semiconductors; aluminium compounds; electroluminescence; gallium compounds; high electron mobility transistors; hot carriers; wide band gap semiconductors; AlGaN-GaN; HEMT; electrical characterization; electroluminescence characterization; hot electrons; on-state stress tests; stress acceleration factor; time-to-breakdown induced degradation; Degradation; Gallium nitride; HEMTs; Logic gates; MODFETs; Stress; Stress measurement; GaN; HEMTs; degradation; electroluminescence; reliability; traps;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Radar and Wireless Communications (MIKON), 2012 19th International Conference on
Conference_Location :
Warsaw
Print_ISBN :
978-1-4577-1435-1
Type :
conf
DOI :
10.1109/MIKON.2012.6233600
Filename :
6233600
Link To Document :
بازگشت