Title :
Three-dimensional photonic crystals developed by double-angled reactive-ion etching technique
Author :
Suzuki, Katsuyoshi ; Takahashi, Shigeki ; Okano, Makoto ; Imada, Masahiro ; Ishizaki, Kenji ; Nakamori, Takeshi ; Ota, Yuji ; Noda, Susumu
Author_Institution :
Dept. Electron. Sci. & Eng., Kyoto Univ., Kyoto, Japan
Abstract :
Three-dimensional photonic crystals are successfully fabricated by a double-angled deep-etching technique. Furthermore, bonding a light emitter onto or between three-dimensional crystals has been shown to enhance or suppress emission.
Keywords :
bonding processes; elemental semiconductors; optical fabrication; photonic crystals; silicon; sputter etching; Si; bonding process; double-angled reactive-ion etching technique; light emitter; single-crystalline silicon wafer; three-dimensional photonic crystal fabrication; Bonding; Etching; Lattices; Light emitting diodes; Optical attenuators; Optical surface waves; Personal communication networks; Photonic crystals; Silicon; Spontaneous emission;
Conference_Titel :
LEOS Annual Meeting Conference Proceedings, 2009. LEOS '09. IEEE
Conference_Location :
Belek-Antalya
Print_ISBN :
978-1-4244-3680-4
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2009.5343486
