DocumentCode
2561950
Title
Femtosecond laser micromachining of tellurite thin film waveguides
Author
Fernandez, T.T. ; Irannejad, M. ; Steenson, P. ; Jha, A. ; Jose, G.
Author_Institution
Sch. of Process, Environ. & Mater. Eng., Univ. of Leeds, Leeds, UK
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
2
Abstract
Er:Yb:Ce doped phosphate modified tellurite thin films were produced by pulsed laser deposition. Femtosecond laser micromachining technique was used to pattern ridge waveguides on to the film surface. A series of experiments were carried out to optimize the thin film formation and also to pattern waveguides on to its surface with varying environmental and fluence conditions. The optimum waveguide was characterized in its passive and active regimes to ensure its operation at the C+L telecommunication band. The waveguides will be primarily used to amplification purposes for signal wavelengths ranging from 1520 nm - 1620 nm.
Keywords
cerium; erbium; high-speed optical techniques; laser beam machining; optical waveguides; pulsed laser deposition; ridge waveguides; tellurium compounds; ytterbium; C+L telecommunication band; TeO2:Ce; TeO2:Er; TeO2:Yb; femtosecond laser micromachining; film surface; pulsed laser deposition; ridge waveguides; tellurite thin film waveguides; thin film formation; wavelength 1520 nm to 1620 nm; Laser ablation; Laser modes; Micromachining; Optical waveguides; Pulsed laser deposition; Ultrafast optics; Waveguide lasers; C+L telecommunication band; Erbium doping; Pulsed laser deposition; femtosecond laser micromachining; tellurite; thin films;
fLanguage
English
Publisher
ieee
Conference_Titel
Transparent Optical Networks (ICTON), 2011 13th International Conference on
Conference_Location
Stockholm
ISSN
2161-2056
Print_ISBN
978-1-4577-0881-7
Electronic_ISBN
2161-2056
Type
conf
DOI
10.1109/ICTON.2011.5971058
Filename
5971058
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