• DocumentCode
    2563244
  • Title

    Cavitation erosion of Ti coatings produced by the vacuum arc method

  • Author

    Marinin, V.G. ; Kovalenko, V.I. ; Lomino, N.S. ; Zadneprovsky, Yu.A. ; Ovcharenko, V.D.

  • Author_Institution
    Nat. Sci. Center, Kharkov Inst. of Phys. & Technol., Ukraine
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    567
  • Abstract
    Studies were made into cavitation erosion of titanium coatings in water. The coatings were produced by the vacuum arc method and differed between themselves by the presence or absence of cathode macroparticles. The macroparticles were eliminated from the condensed plasma flow by a special filtering device. The principal parameters of coating deposition process were the bias potential applied to the substrate and the substrate temperature during condensation. The coatings were examined to determine both the weight losses by specimens under the action of cavitation and the film microhardness. It is shown that the coatings deposited in the filtered flow have an improved erosion resistance in comparison with the coatings containing macroparticle inclusions
  • Keywords
    condensation; hardness testing; microhardness; plasma deposited coatings; substrates; titanium; vacuum deposited coatings; wear; wear resistance; wear resistant coatings; wear testing; Ti; Ti coatings; bias potential; cathode macroparticles; cavitation erosion; coating deposition process; coatings; condensation; condensed plasma flow elimination; erosion resistance; film microhardness; macroparticle inclusions; stainless steel substrate; substrate temperature; vacuum arc method; weight losses; Cathodes; Coatings; Magnetostriction; Plasma devices; Plasma measurements; Plasma temperature; Substrates; Temperature measurement; Titanium; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 2000. Proceedings. ISDEIV. XIXth International Symposium on
  • Conference_Location
    Xi´an
  • Print_ISBN
    0-7803-5791-4
  • Type

    conf

  • DOI
    10.1109/DEIV.2000.879052
  • Filename
    879052