• DocumentCode
    2564563
  • Title

    Custom tailored ion energy distribution functions online for everybody

  • Author

    Predki, Martin ; Shihab, Mohammed ; Wollny, Alexander ; Brinkmann, Ralf Peter

  • Author_Institution
    Inst. for Theor. Electr. Eng., Ruhr-Univ. Bochum, Bochum, Germany
  • fYear
    2012
  • fDate
    8-13 July 2012
  • Abstract
    Plasma processes, particularly plasma etching and plasma deposition processes are crucial for a large variety of industrial manufacturing processes. For these processes the knowledge of the ion energy distribution function plays a key role. Measurements of the ion energy distribution function (IEDF) are at least challenging and often impossible in industrial processes. An alternative to measurements of the IEDF are simulations.
  • Keywords
    manufacturing processes; plasma deposition; sputter etching; IEDF; custom tailored ion energy distribution functions; industrial manufacturing process; plasma deposition; plasma etching; plasma process; Distribution functions; Educational institutions; Electrical engineering; Etching; Manufacturing processes; Plasma measurements; Plasmas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
  • Conference_Location
    Edinburgh
  • ISSN
    0730-9244
  • Print_ISBN
    978-1-4577-2127-4
  • Electronic_ISBN
    0730-9244
  • Type

    conf

  • DOI
    10.1109/PLASMA.2012.6383885
  • Filename
    6383885