DocumentCode
2564563
Title
Custom tailored ion energy distribution functions online for everybody
Author
Predki, Martin ; Shihab, Mohammed ; Wollny, Alexander ; Brinkmann, Ralf Peter
Author_Institution
Inst. for Theor. Electr. Eng., Ruhr-Univ. Bochum, Bochum, Germany
fYear
2012
fDate
8-13 July 2012
Abstract
Plasma processes, particularly plasma etching and plasma deposition processes are crucial for a large variety of industrial manufacturing processes. For these processes the knowledge of the ion energy distribution function plays a key role. Measurements of the ion energy distribution function (IEDF) are at least challenging and often impossible in industrial processes. An alternative to measurements of the IEDF are simulations.
Keywords
manufacturing processes; plasma deposition; sputter etching; IEDF; custom tailored ion energy distribution functions; industrial manufacturing process; plasma deposition; plasma etching; plasma process; Distribution functions; Educational institutions; Electrical engineering; Etching; Manufacturing processes; Plasma measurements; Plasmas;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location
Edinburgh
ISSN
0730-9244
Print_ISBN
978-1-4577-2127-4
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2012.6383885
Filename
6383885
Link To Document