DocumentCode
2567597
Title
Parallelized two-dimensional particle-in-cell simulation for capacitively coupled plasmas using graphic processing units
Author
Song, In Cheol ; Bae, H.W. ; Hwang, Sung Woo ; Lee, Hongseok ; Lee, Hyung Jong
Author_Institution
Pusan Nat. Univ., Pusan, South Korea
fYear
2012
fDate
8-13 July 2012
Abstract
A large size chamber with 450 mm and plasma wall-interaction for the nano-scale feature are needed in semiconductor manufacturing industry recently. However, there are difficulties to experiment and simulate a large scale reactor chamber and nano-scale features. In the simulation case, plasma simulation using particle-in-cell (PIC) method shows very high accuracy compared with fluid simulations. However, PIC method has a disadvantage of slow speed caused by individual calculation of lots of computational particles. Recently, new computing method using graphic processing units (GPUs) enables to make a low-cost and low-power personal super computer and there is a study to utilize the GPUs for the parallelization of PIC plasma simulators [1,2]. To overcome the heavy computation problem of a PIC method, we have developed a parallelized PIC code using GPUs. In this work, two-dimensional axisymmetric simulator for a capacitively coupled plasma (CCP) sources is presented with the performance improvement using GPUs. Also, investigated were plasma phenomena with frequency variation as well as dual frequency with phase variation for CCP.
Keywords
graphics processing units; parallel processing; physics computing; plasma simulation; plasma sources; plasma-wall interactions; PIC method; capacitively coupled plasma; capacitively coupled plasma sources; computational particles; graphic processing units; low-cost personal super computer; low-power personal super computer; parallelized two-dimensional particle-in-cell simulation; plasma wall-interaction; semiconductor manufacturing industry; size 450 nm; two-dimensional axisymmetric simulator; Computational modeling; Educational institutions; Graphics processing units; Inductors; Manufacturing industries; Plasma simulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2012 Abstracts IEEE International Conference on
Conference_Location
Edinburgh
ISSN
0730-9244
Print_ISBN
978-1-4577-2127-4
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2012.6384063
Filename
6384063
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