DocumentCode :
2572297
Title :
Influence of quantum confinement effects on single electron and single hole transistors
Author :
Ishikuro, H. ; Hiramoto, Toshiro
Author_Institution :
Inst. of Ind. Sci., Tokyo Univ., Japan
fYear :
1998
fDate :
6-9 Dec. 1998
Firstpage :
119
Lastpage :
122
Abstract :
Influences of quantum confinement effects on the device characteristics of single electron and single hole transistors are studied using Si narrow channel MOSFETs with both p/sup +/ and n/sup +/ source/drain contacts. Numerical calculations of the energy spectrum in silicon quantum dots are also carried out to support the experimental results. The obtained results indicate the difficulty in predicting the peak positions of the Coulomb blockade oscillations due to the quantum confinement effects in nanoscale devices. For the application of SETs, a, new method to adjust the peak position by injecting charges into silicon nano-crystals or traps is proposed and demonstrated.
Keywords :
Coulomb blockade; MOSFET; elemental semiconductors; nanotechnology; semiconductor quantum dots; silicon; single electron transistors; Coulomb blockade oscillations; Si; energy spectrum; n/sup +/ source/drain contacts; nano-crystals; narrow channel MOSFETs; p/sup +/ source/drain contacts; quantum confinement effects; quantum dots; single electron transistors; single hole transistors; Charge carrier processes; Electron traps; MOSFETs; Nanoscale devices; Potential well; Quantum dots; Silicon; Single electron transistors; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1998. IEDM '98. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-4774-9
Type :
conf
DOI :
10.1109/IEDM.1998.746293
Filename :
746293
Link To Document :
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