Title :
Most efficient alternative as a way of sub-80 nm contact holes and trenches formation
Author :
Jung Hwan Hah ; Jin-Young Yoon ; Hata Mitsuhiro ; Hyun-Woo Kim ; Sang-Gyun Woo ; Han-Ku Cho ; Woo-Sung Han
Author_Institution :
Semicond. R&D Div., Samsung Electron. Co. Ltd., Gyeonggi, South Korea
Abstract :
In this paper, we compared three processes to confirm their feasibility and extract the weak and strong aspects of each process. Each process was evaluated with a mask having 1:1 square array and the isolated contact hole patterns of various contact CD and pitches and then its appropriate or best layout was determined or recommended for real device application.
Keywords :
arrays; masks; nanocontacts; 80 nm; CD; contact holes; isolated contact hole patterns; mask; pitches; square array; trenches formation; Chemical processes; Chemical technology; Electronics industry; Lithography; Page description languages; Research and development;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268495
