Title :
Potentials of immersion lithography
Author_Institution :
Opt. Technol. Res. Center, Canon Inc., Tochigi, Japan
Abstract :
In this paper, the development and future potential of immersion lithography are examined.
Keywords :
photolithography; ArF technology; immersion lithography; microlithography; Costs; Fluctuations; History; Lithography; Microscopy; Nitrogen; Optical polarization; Optical refraction; Optical variables control; Proposals;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268503
