Title :
Fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate
Author :
Fujimura, T. ; Ikeda, A. ; Etoh, S. ; Hattori, R. ; Kuroki, Y. ; Hidaka, M. ; Chang, S.S.
Author_Institution :
Graduate Sch. of Inf. Sci. & Electr. Eng., Kyushu Univ., Fukuoka, Japan
Abstract :
In this paper we study about the fabrication of absorber-embedded in membrane type deep X-ray exposure mask with wide exposure area made with Si substrate.
Keywords :
X-ray masks; electroplating; micromachining; silicon compounds; Si; Si substrate; SiO/sub 2/; absorber-embedded membrane; deep X-ray exposure mask; Biomembranes; Etching; Fabrication; Gold; Laboratories; Lithography; Microstructure; Plasma applications; Plasma x-ray sources; Strontium;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268531
