• DocumentCode
    2578596
  • Title

    Advantageous exposure of X architecture pattern when using a variable shaped beam tool

  • Author

    Dorl, W. ; Boettcher, M. ; Eichhorn, H.-G. ; Gramss, J. ; Hahmann, P. ; Lemke, M. ; Schnabel, B. ; Weidenmueller, U.

  • Author_Institution
    Leica Microsyst. Lithography GmbH, Jena, Germany
  • fYear
    2003
  • fDate
    29-31 Oct. 2003
  • Firstpage
    102
  • Abstract
    Summary form only given. In this paper, the advantageous exposure of X architecture pattern when using a variable shaped beam tool is discussed. A X architecture pattern contains lines which represents a Manhatten pattern itself, but 45 degrees rotated additionally. To expose this kind of pattern with high throughout and high pattern fidelity is a challenging task.
  • Keywords
    electron beam lithography; integrated circuit interconnections; integrated circuit reliability; Manhatten pattern; X architecture pattern; chip components; electron beam lithography; high pattern fidelity; integrated circuit interconnections; integrated circuit reliability; variable shaped beam tool; Data handling; Electron beams; Lithography; Routing; Testing; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
  • Conference_Location
    Tokyo, Japan
  • Print_ISBN
    4-89114-040-2
  • Type

    conf

  • DOI
    10.1109/IMNC.2003.1268596
  • Filename
    1268596
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2578596