Title :
Imprint-photo hybrid lithography with conventional contact aligner
Author :
Kawata, H. ; Hirai, Y. ; Kikuta, H.
Author_Institution :
Graduate Sch. of Eng., Osaka Prefecture Univ., Sakai, Japan
Abstract :
A new combined-nanoimprint-and-photolithography (CNP) process is proposed. A low cost conventional aligner is used. Fine patterns up to 0.25 /spl mu/m can be fabricated by the new process.
Keywords :
masks; nanolithography; photolithography; photoresists; 0.25 micron; conventional contact aligner; fine patterns; hybrid photolithography; nanoimprint; nanolithography; Cities and towns; Costs; Etching; Fabrication; Glass; Gratings; Interference; Lithography; Nanolithography; Resists;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268616
