Title :
5-nm-order electron-beam lithography for nanodevice fabrication
Author :
Yamazaki, K. ; Namatsu, H.
Author_Institution :
NTT Basic Res. Lab., NTT Corp., Kanagawa, Japan
Abstract :
In this paper, electron beam lithography for nanodevice fabrication was studied. SEM micrographs of 30 nm thick HSQ resist are shown.
Keywords :
electron resists; nanotechnology; organic compounds; scanning electron microscopy; 30 nm; 5 nm; HSQ resist; SEM; electron-beam lithography; nanodevice fabrication; Electron optics; Electrooptic deflectors; Fabrication; Hydrogen; Laboratories; Lithography; Nanolithography; Nanotechnology; Resists; Scattering;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
DOI :
10.1109/IMNC.2003.1268626
