DocumentCode :
2579986
Title :
A Novel Low-temperature Gate Oxynitride For CMOS Technologies
Author :
Diaz, C. ; Cox, M. ; Greene, W. ; Perlaki, F. ; Carr, E. ; Manna, I. ; Bayoumi, A. ; Cao, M. ; Shamma, N. ; Tavassoli, M. ; Chi, C. ; Farrar, N. ; Lefforge, D. ; Chang, Y. ; Langley, B. ; Marcoux, P.
Author_Institution :
ULSI Research Lab., tMaterials Characterization Lab., 1 Integrated Circuits Business Division Hewlett-Packard Co., 3500 Deer Creek Road, Palo Alto, CA 94304
fYear :
1997
fDate :
10-12 June 1997
Firstpage :
49
Lastpage :
50
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
Type :
conf
DOI :
10.1109/VLSIT.1997.623689
Filename :
623689
Link To Document :
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