2579986

A Novel Low-temperature Gate Oxynitride For CMOS Technologies

Diaz, C. ; Cox, M. ; Greene, W. ; Perlaki, F. ; Carr, E. ; Manna, I. ; Bayoumi, A. ; Cao, M. ; Shamma, N. ; Tavassoli, M. ; Chi, C. ; Farrar, N. ; Lefforge, D. ; Chang, Y. ; Langley, B. ; Marcoux, P.

ULSI Research Lab., tMaterials Characterization Lab., 1 Integrated Circuits Business Division Hewlett-Packard Co., 3500 Deer Creek Road, Palo Alto, CA 94304

1997

10-12 June 1997

49

50

English

ieee

VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on

4-930813-75-1

conf

10.1109/VLSIT.1997.623689

623689