DocumentCode :
2580589
Title :
Fabrication of molecular photoelectronic device using polysilane nanowires
Author :
Tsukuda, S. ; Seki, S. ; Saeki, A. ; Kozawa, T. ; Tagawa, S. ; Sugimoto, M. ; Idesaki, A. ; Tanaka, S.
Author_Institution :
Inst. of Sci. & Ind. Res., Osaka Univ., Mihogaoka, Japan
fYear :
2003
fDate :
29-31 Oct. 2003
Firstpage :
222
Lastpage :
223
Abstract :
In this paper we report the fabrication of a molecular photoelectronic device using polysilane nanowires. Nanowires were directly formed on a Si substrate because single ion hitting methods provide good adhesion between the substrate and one end of the nanowire. Results are obtained from SEM and AFM.
Keywords :
adhesion; atomic force microscopy; molecular electronics; nanowires; photoelectric devices; polymers; scanning electron microscopy; AFM; SEM; Si; adhesion; molecular photoelectronic device fabrication; polysilane nanowires; single ion hitting methods; Chemistry; Electrodes; Electronics industry; Fabrication; Nanostructured materials; Nanowires; Platinum; Shape control; Substrates; Textile industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 2003. Digest of Papers. 2003 International
Conference_Location :
Tokyo, Japan
Print_ISBN :
4-89114-040-2
Type :
conf
DOI :
10.1109/IMNC.2003.1268722
Filename :
1268722
Link To Document :
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