Title :
Advanced Gate-stack Architecture For Low-voltage Dual-workfunction CMOS Technologies With Shallow Trench Isolation
Author :
Schwalke, U. ; Kerber, M. ; Koller, K. ; Ludwig, B. ; Seidl, A.
Author_Institution :
Siemens, Corp. R&D, Microelectronics, 2) Siemens, Semiconductor Division 81739 Munich, Germany
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
DOI :
10.1109/VLSIT.1997.623700
