DocumentCode :
2584123
Title :
An Advanced Ge Pre-amorphization Salicide Technology For Sub-quarter-micrometer SOI CMOS Devices
Author :
Hsiao, T.C. ; Ping Liu ; Woo, J.C.S.
Author_Institution :
Department of Electrical Engineering, University of California, Los Angeles, CA 90095-1594
fYear :
1997
fDate :
10-12 June 1997
Firstpage :
95
Lastpage :
96
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1997. Digest of Technical Papers., 1997 Symposium on
Print_ISBN :
4-930813-75-1
Type :
conf
DOI :
10.1109/VLSIT.1997.623712
Filename :
623712
Link To Document :
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