DocumentCode
2585488
Title
Opportunities at mm-Wave frequencies: SiGe or CMOS?
Author
Veenstra, Hugo ; Notten, Marc
Author_Institution
Philips Res., Eindhoven
fYear
2008
fDate
27-28 Oct. 2008
Firstpage
99
Lastpage
102
Abstract
In contrast to what is generally assumed, the evolution of fT beyond the 45 nm CMOS generation may not be able to follow the ITRS roadmap. Moreover, the gap between intrinsic device and circuit performance is expected to increase with new generations, due to an increase in interconnect parasitic capacitance in the transistor pcell area. Such problems are not expected for SiGe processes. The move to higher frequencies for new applications leads to a shift in system partitioning, since the receiver front-end must be located physically close to the antenna. Emerging mm-Wave applications such as radar and high data-rate wireless need to apply beam-forming which can be realized at low cost using phased arrays. These RF requirements justify a 2-chip solution: one analog phased array front-end plus one digital SoC. RF signal distribution on chip will be a determining factor in the choice of technology. For this reason, SiGe is and will remain leading over CMOS for mm-Wave.
Keywords
CMOS integrated circuits; Ge-Si alloys; capacitance; integrated circuit interconnections; millimetre wave receivers; system-on-chip; transistor circuits; CMOS generation; RF signal distribution on chip; SiGe; analog phased array front-end; beam-forming; digital SoC; high data-rate wireless; interconnect parasitic capacitance; radar; receiver; transistor pcell area; Circuit optimization; Frequency; Germanium silicon alloys; Integrated circuit interconnections; Parasitic capacitance; Phased arrays; Radar antennas; Radar applications; Receiving antennas; Silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Integrated Circuit Conference, 2008. EuMIC 2008. European
Conference_Location
Amsterdam
Print_ISBN
978-2-87487-007-1
Type
conf
DOI
10.1109/EMICC.2008.4772238
Filename
4772238
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