DocumentCode :
2585584
Title :
A Methodology to Characterize the Low-Frequency Noise of InP Based Transistors
Author :
De Souza, A. A Lisboa ; Nallatamby, J.C. ; Prigent, M.
Author_Institution :
Xlim -Dept., Univ. de Limoges, Limoges
fYear :
2008
fDate :
27-28 Oct. 2008
Firstpage :
123
Lastpage :
126
Abstract :
This paper describes a methodology to measure the low-frequency noise of InP-based transistors. These transistors have demonstrated transition frequencies (ft) greater than 200 GHz, generally achieved at current densities in excess of 200 kA/cm2. Depending on the DC current gain, this may represent base currents of some mA. For the first time, curves of Sib, Sic and Sibic for base currents of up to 3 mA are demonstrated, in excellent agreement with those obtained from one-port measurements. This is only possible with an accurate experimental characterisation of the small-signal parameters of the transistor, which are frequency-dependent due to self-heating.
Keywords :
III-V semiconductors; current density; indium compounds; semiconductor device noise; transistors; DC current gain; InP; base currents; current densities; low-frequency noise; one-port measurements; self-heating; small-signal parameters; transistors; transition frequencies; Bipolar transistors; Circuit noise; Current measurement; Frequency; Impedance; Indium phosphide; Low-frequency noise; Noise measurement; Silicon carbide; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuit Conference, 2008. EuMIC 2008. European
Conference_Location :
Amsterdam
Print_ISBN :
978-2-87487-007-1
Type :
conf
DOI :
10.1109/EMICC.2008.4772244
Filename :
4772244
Link To Document :
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