Title :
Thermal analysis of ultra-thin body device scaling [SOI and FinFet devices]
Author :
Pop, E. ; Dutton, R. ; Goodson, K.
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., CA, USA
Abstract :
This paper explores the effect of confined dimensions and complicated geometries on the self-heating of ultra-thin body SOI and FinFET devices. A compact thermal model is introduced, incorporating the most advanced understanding of nanoscale heat conduction available. Novel device scaling is analyzed from a thermal point of view. We show device temperatures are very sensitive to the choice of drain and channel extension dimensions, and suggest a parameter design space which can help alleviate thermal problems. ITRS power guidelines below the 25 nm technology node should be revised if isothermal scaling of thin-body devices is desired.
Keywords :
MOSFET; heat conduction; semiconductor device models; silicon-on-insulator; thermal analysis; 25 nm; FinFET; SOI; UTB silicon-on-insulator devices; channel extension dimensions; compact thermal model; confined dimensions; drain extension dimensions; isothermal scaling; nanoscale heat conduction; self-heating; thermal analysis; ultra-thin body device scaling; Conductive films; FinFETs; Impurities; Phonons; Scattering; Semiconductor films; Silicon on insulator technology; Space technology; Thermal conductivity; Thermal resistance;
Conference_Titel :
Electron Devices Meeting, 2003. IEDM '03 Technical Digest. IEEE International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-7872-5
DOI :
10.1109/IEDM.2003.1269420