DocumentCode
2591978
Title
Tuning a process while performing SPC: an approach based on the sequential design of experiments
Author
Sachs, Emanuel ; Ingolfsson, Armann ; Ha, Sungdo
Author_Institution
MIT, Cambridge, MA, USA
fYear
1990
fDate
11-12 Sep 1990
Firstpage
126
Lastpage
130
Abstract
An approach to process control called generalized SPC which allows for the diagnosis of a process while the process is being tuned is discussed. A control module, the run by run controller, that implements a form of adaptive control based on the sequential design of experiments is discussed. Statistical process control is compared to the run by run controller
Keywords
adaptive control; controllers; statistical process control; SPC; adaptive control; control module; run by run controller; sequential design; tuning; Automatic control; Design optimization; Error correction; Monitoring; Predictive models; Process control; Process design; Production; Response surface methodology; US Department of Energy;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop, 1990. ASMC 90 Proceedings. IEEE/SEMI 1990
Conference_Location
Danvers, MA
Type
conf
DOI
10.1109/ASMC.1990.111236
Filename
111236
Link To Document