DocumentCode
2595536
Title
Analysis of Charging Kinetics of Oxide Ceramics under Short Electron Beam Irradiation: Numerical Simulation of Secondary Electron Emission
Author
Aoufi, A. ; Zarbout, K. ; Damamme, G. ; Moya, G.
Author_Institution
PECM/SMS/MTT, CNRS, St. Etienne
fYear
2008
fDate
26-29 Oct. 2008
Firstpage
141
Lastpage
144
Abstract
This analysis is connected with the evolution of trapped charges, during electron injection, using a defocused electron beam of a Scanning Electron Microscope especially equipped with a secondary electron low-noise detector. Hence, during pulses of about ten ms, giving injection doses of a few pC, the measurements of the influence induced currents, Iind(t), due to the image charges Qind (t) in the metallic holder (corresponding to the trapped charges Qp (t) in the sample) and the total secondary electron currents, Isigma(t), can be carried out. Considering the experimental conditions defined by small primary current density (#104 pA/cm2) and low surface charge density (#10 pC/cm2), the relation, I0 = Iind(t) + Isigma (t) can be verified [1] leading to (after integration over the injection time) a charge balance: Qinj = Qind+Qsigma = Qp+Qsigma The secondary electron emission yield, see(t) = 1 - { Iind (t) / [Iind (t)+Isigma (t)] }, is experimentally studied as a function of Qp(t). A simulation, which corresponds to a new mathematical model describing the spatial and temporal charge trapping, computes the temporal evolution of the secondary electron emission, see(t), as a function of net trapped charge, Qp(t), for various values of the kinetic energy of the primary electrons. The comparison between experimental results and numerical simulations would permit to evaluate absorption and transfer cross sections as well as mobility of the secondary electrons.
Keywords
ceramics; charge injection; electron beam effects; electron traps; hole traps; scanning electron microscopy; secondary electron emission; charging kinetics; defocused electron beam; during electron injection; oxide ceramics; primary current density; scanning electron microscope; secondary electron emission; secondary electron low-noise detector; short electron beam irradiation; trapped charges; Ceramics; Current measurement; Electron beams; Electron emission; Electron traps; Kinetic theory; Numerical simulation; Pulse measurements; Q measurement; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical Insulation and Dielectric Phenomena, 2008. CEIDP 2008. Annual Report Conference on
Conference_Location
Quebec, QC
Print_ISBN
978-1-4244-2548-8
Electronic_ISBN
978-1-4244-2549-5
Type
conf
DOI
10.1109/CEIDP.2008.4772867
Filename
4772867
Link To Document