DocumentCode :
2596833
Title :
A Rigorous Model For Dopant-dopant Pair Diffusion In Silicon
Author :
Orlowski, Marius
Author_Institution :
Motorola Inc.
fYear :
1990
fDate :
3-4 Jun 1990
Firstpage :
7
Lastpage :
8
Keywords :
Boron; Delta modulation; Displays; Equations; Impurities; Semiconductor process modeling; Silicon; Thermodynamics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
Type :
conf
DOI :
10.1109/NUPAD.1990.748250
Filename :
748250
Link To Document :
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