DocumentCode

2596833

Title

A Rigorous Model For Dopant-dopant Pair Diffusion In Silicon

Author

Orlowski, Marius

Author_Institution

Motorola Inc.

fYear

1990

fDate

3-4 Jun 1990

Firstpage

7

Lastpage

8

Keywords

Boron; Delta modulation; Displays; Equations; Impurities; Semiconductor process modeling; Silicon; Thermodynamics;

fLanguage

English

Publisher

ieee

Conference_Titel

Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on

Type

conf

DOI

10.1109/NUPAD.1990.748250

Filename

748250