Title :
An Improved Model for Ion Implantation in Two-Dimensions and Application to the Analysis of LDD Device Performance
Author :
Crandle, T.L. ; Motzny, S.J. ; Ward, D.E. ; Grabowski, W.B. ; Pack, R.C.
Author_Institution :
Technology Modeling Associates
Keywords :
Electric breakdown; Etching; FETs; Implants; Ion implantation; Monte Carlo methods; Performance analysis; Predictive models; Scattering; Semiconductor process modeling;
Conference_Titel :
Numerical Modeling of Processes and Devices for Integrated Circuits, 1990. NUPAD III. 1990 Workshop on
DOI :
10.1109/NUPAD.1990.748293
