DocumentCode :
2599095
Title :
Retardation of Dopant Diffusion During Fabrication and Effects Upon Junction Depth and Microelectronic Device Performance
Author :
Pemsel, E.R. ; Lytle, W.J. ; Dzimianski, J.W. ; Skinner, S.M.
Author_Institution :
Westinghouse Electric Corporation, Aerospace Division, Baltimore, Maryland
fYear :
1964
fDate :
Sept. 1964
Firstpage :
404
Lastpage :
420
Keywords :
Diodes; Etching; Fabrication; Microelectronics; Photovoltaic systems; Resistors; Silicon; Solar power generation; Surface cleaning; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physics of Failure in Electronics, 1964. Third Annual Symposium on the
Conference_Location :
Chicago, IL, USA
ISSN :
0097-2088
Type :
conf
DOI :
10.1109/IRPS.1964.362301
Filename :
4207655
Link To Document :
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