Title :
Application of a survey sampling critical area computation tool in a manufacturing environment [IC yield]
Author :
Duvivier, Frederic ; Allan, Gerard A.
Author_Institution :
Dept. of Device Eng., SGS-Thomson Microelectron., Crolles, France
Abstract :
This paper reports on the use of a survey sampling based critical area estimation tool (EYES) within an industrial environment. The increase in extraction speed, the reduced resource requirements and ease of use enable efficient yield modelling. Result based on nine commercial devices averaging 1 million transistors with yields over a 23% range are presented
Keywords :
electronic engineering computing; estimation theory; integrated circuit yield; EYES; IC manufacture; IC yield; extraction speed; industrial environment; manufacturing environment; survey sampling critical area computation tool; yield modelling; Algorithm design and analysis; Computer aided manufacturing; Eyes; Microelectronics; Predictive models; Pulp manufacturing; Sampling methods; Semiconductor device manufacture; Virtual manufacturing; Yield estimation;
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 1996. Proceedings., 1996 IEEE International Symposium on
Conference_Location :
Boston, MA
Print_ISBN :
0-8186-7545-4
DOI :
10.1109/DFTVS.1996.571986
