Title :
Nanoscale bit-patterned media for next generation magnetic data storage applications
Author :
Litvinov, Dmitri ; Parekh, Vishal ; Chunsheng, E. ; Smith, Darren ; Rantschler, James ; Ruchhoeft, Paul ; Weller, Dieter ; Khizroev, Sakhrat
Author_Institution :
Center for Nanomagnetic Syst., Univ. Houston, Houston, TX
Abstract :
Design considerations and fabrication of bit-patterned magnetic recording media are presented. The application of ion-beam proximity printing, a high-throughput direct-write lithography, to media patterning is evaluated. Ultra-high magnetic anisotropy (Co/Pd)N magnetic multilayers are analyzed as candidates for patterned recording layers. Following patterning, optimized multilayers are shown to exhibit coercivity values well in excess of 14kOe. It is found that the magnetization reversal in patterned bits takes place via domain wall nucleation and propagation. The nucleation field and the location of the nucleation site strongly depend on the bit edge imperfections and contribute to finite switching field distribution. Playback off a bit-patterned media using various magnetic reader designs is analyzed using reciprocity theory.
Keywords :
cobalt; coercive force; magnetic domain walls; magnetic multilayers; magnetic storage; magnetisation reversal; nanolithography; nanopatterning; nucleation; palladium; proximity effect (lithography); Co-Pd; domain wall nucleation; finite switching field distribution; high-throughput direct-write lithography; ion-beam proximity printing; magnetic data storage; magnetic multilayers; magnetization reversal; media patterning; nanoscale bit-pattemed media; reciprocity theory; ultrahigh magnetic anisotropy; Fabrication; Lithography; Magnetic analysis; Magnetic anisotropy; Magnetic domain walls; Magnetic multilayers; Magnetic recording; Memory; Perpendicular magnetic anisotropy; Printing; magnetic data storage; nanomagnetic arrays; patterned medium; recording physics;
Conference_Titel :
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-0607-4
Electronic_ISBN :
978-1-4244-0608-1
DOI :
10.1109/NANO.2007.4601217