DocumentCode :
2606903
Title :
An Investigation of Flaws in Complex CMOS Devices by a Scanning Photoexcitation Technique
Author :
Levy, Miguel E.
Author_Institution :
Hughes Aircraft Company, Culver City, California. (213) 391-0711 Ext. 6257
fYear :
1977
fDate :
28216
Firstpage :
44
Lastpage :
53
Abstract :
A new method is described for using the optical scanner as an inspection instrument for complex CMOS microcircuits. Named the State Superposition Technique, the new method generates a photoresponse image that contains contributions from all active elements in the DUT. Results obtained with CMOS life-test specimens are presented.
Keywords :
Character generation; Circuit testing; Image analysis; Image generation; Inspection; Instruments; Optical devices; Optical sensors; P-n junctions; Photoconductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1977. 15th Annual
Conference_Location :
LAs Vegas, NV, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1977.362771
Filename :
4208158
Link To Document :
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