Title :
Young´s Modulus of High Aspect Ratio Si3N4 Nano-thickness Membrane
Author :
Chen, Ping-Hei ; Yang, Cheng-Hao ; Tsai, Chien-Ying ; Chang, Tien-Li ; Hsu, Wei-Cheng ; Chen, Ta-Chih
Author_Institution :
Dept. of Mech. Eng., Nat. Taiwan Univ., Taipei
Abstract :
The physical properties of nano-thickness membrane are known to be different from those of bulk material. However, it requires a novel approach to measure the physical properties of nano-thickness membrane due to its nano-scale dimension. Currently, many potential applications for the nanoscale structures are not really practical because their mechanical properties have not been established. In this study, a suspended high aspect ratio silicon nitride nano-thickness membrane is fabricated by using silicon micro-machining. The membrane has a thickness of 30 nm and an area of 4 mm by 7 mm, as shown in Fig.1. Young´s modulus of the silicon nitride nano-thickness membrane is determined from the deflection of the suspended membrane, which is resulted from the weight of membrane itself.
Keywords :
Young´s modulus; membranes; micromachining; nanostructured materials; nanotechnology; silicon compounds; Si3N4; Young´s modulus; mechanical property; nanoscale structures; silicon micromachining; silicon nitride nanothickness membrane; size 30 nm; suspended membrane; Biomembranes; Mechanical engineering; Mechanical factors; Microstructure; Nanostructured materials; Nanostructures; Silicon; Strain measurement; Structural beams; Testing; Nano Membrane; Silicon nitride; Young¿s Modulus;
Conference_Titel :
Nanotechnology, 2007. IEEE-NANO 2007. 7th IEEE Conference on
Conference_Location :
Hong Kong
Print_ISBN :
978-1-4244-0607-4
Electronic_ISBN :
978-1-4244-0608-1
DOI :
10.1109/NANO.2007.4601367