Title :
The use of Microfluorescence Analysis for Process Control in the Semiconductor Manufacturing Industry
Author_Institution :
International Business Machines Corporation, Data Systems Division, Hopewell Junction, New York 12533. (914) 897-4960
Abstract :
A new method has been developed for the rapid, non-destructive, in situ detection and identification of sub-micron organic particulate contaminants. The equipment, its operation, and its application to the process control of a semiconductor manufacturing operation are discussed.
Keywords :
Contamination; Fingerprint recognition; Fluorescence; Manufacturing industries; Manufacturing processes; Mercury (metals); Process control; Semiconductor device manufacture; Semiconductor devices; Xenon;
Conference_Titel :
Reliability Physics Symposium, 1979. 17th Annual
Conference_Location :
San Diego, CA, USA
DOI :
10.1109/IRPS.1979.362892
