DocumentCode :
2609997
Title :
Passivated emitters in silicon solar cells
Author :
King, Richard ; Gruenbaum, Peter ; Sinton, Ronald ; Swanson, Richard
Author_Institution :
Dept. of Electr. Eng., Stanford Univ., CA, USA
fYear :
1990
fDate :
21-25 May 1990
Firstpage :
227
Abstract :
In high-efficiency silicon solar cells with low metal contact coverage fractions and high bulk lifetimes, cell performance is often dominated by recombination in the oxide-passivated diffusions on the cell surface. Measurements of the emitter saturation current density, Jo, of oxide-passivated, boron and phosphorus diffusions are presented, and from these measurements, the dependence of surface recombination velocity on dopant concentration is extracted. The lowest observed values of Jo which are stable under UV light are given for both boron- and phosphorus-doped, oxide-passivated diffusions, for both textured and untextured surfaces. Contour plots which incorporate the above data were applied to two types of backside-contact solar cells with large area (37.5 cm2) and one-sun efficiencies up to 22.7%
Keywords :
electron-hole recombination; elemental semiconductors; passivation; silicon; solar cells; Si solar cells; Si:B solar cell; Si:P solar cell; bulk lifetimes; contour plots; emitter saturation current density; metal contact coverage fractions; oxide-passivated diffusions; performance; surface recombination velocity; Boron; Current density; Current measurement; Data mining; Density measurement; Oxidation; Photovoltaic cells; Silicon; Velocity measurement; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference, 1990., Conference Record of the Twenty First IEEE
Conference_Location :
Kissimmee, FL
Type :
conf
DOI :
10.1109/PVSC.1990.111622
Filename :
111622
Link To Document :
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