DocumentCode :
2614826
Title :
Power GaAs FET RF Life Test using Temperature-Compensated Electrical Stressing
Author :
Russell, K.J. ; Dhiman, J.K.
Author_Institution :
Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, Pasadena, CA 91109. (818) 354-6080
fYear :
1986
fDate :
31503
Firstpage :
150
Lastpage :
156
Abstract :
GaAs FETs were aged in RF operation, while keeping the electrical stress on the WETs like that in a typical application. Lifetimes measured were significantly lower than those predicted by life tests using dc bias only. Significant dependence of lifetimes upon the wafer process lot was found. Voltage screening did not provide more reliable devices.
Keywords :
Aging; FETs; Gallium arsenide; Life testing; Performance evaluation; Power generation; Radio frequency; Stress; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium, 1986. 24th Annual
Conference_Location :
Anaheim, CA, USA
ISSN :
0735-0791
Type :
conf
DOI :
10.1109/IRPS.1986.362126
Filename :
4208657
Link To Document :
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