DocumentCode
2640
Title
RF Characterization of Gigahertz Flexible Silicon Thin-Film Transistor on Plastic Substrates Under Bending Conditions
Author
Guoxuan Qin ; Jung-Hun Seo ; Yang Zhang ; Han Zhou ; Weidong Zhou ; Yuxin Wang ; Jianguo Ma ; Zhenqiang Ma
Author_Institution
Sch. of Electron. Inf. Eng., Tianjin Univ., Tianjin, China
Volume
34
Issue
2
fYear
2013
fDate
Feb. 2013
Firstpage
262
Lastpage
264
Abstract
This letter presents fabrication of a flexible 1.5-μm -channel-length silicon thin-film transistor (TFT) on a plastic substrate with a cutoff frequency fT of ~ 3.7 GHz and a maximum oscillation frequency fmax of ~ 12 GHz. Radio-frequency (RF) characterization is conducted for the flexible TFT under uniaxial mechanical bending conditions, indicating slight but notable monotonic performance enhancement with larger bending strains. Equivalent circuit model and theoretical analysis are employed to understand the underlying mechanism. Flexible gigahertz TFTs are shown to be naturally suitable for high-performance RF/microwave applications under mechanical bending (deformation) environment. This letter provides insight on designing and employing flexible gigahertz active devices.
Keywords
bending; elemental semiconductors; equivalent circuits; flexible electronics; microwave transistors; silicon; thin film transistors; RF applications; RF characterization; Si; bending conditions; bending strains; cutoff frequency; deformation environment; equivalent circuit model; flexible channel-length silicon TFT; flexible channel-length silicon thin-film transistor; flexible gigahertz active devices; gigahertz flexible silicon thin-film transistor; high-performance RF applications; high-performance microwave applications; maximum oscillation frequency; mechanical bending environment; notable monotonic performance enhancement; plastic substrates; radiofrequency characterization; size 1.5 mum; uniaxial mechanical bending conditions; Performance evaluation; Plastics; Radio frequency; Silicon; Strain; Substrates; Thin film transistors; Bending strain; flexible electronics; modeling; silicon nanomembrane (SiNM); thin-film transistor (TFT);
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2012.2231853
Filename
6407731
Link To Document