• DocumentCode
    2642355
  • Title

    The impact of narrow width effects on high frequency performance and noise in 35nm multi-finger n-MOSFETs

  • Author

    Yeh, Kuo-Liang ; Chang, Chih-Shiang ; Guo, Jyh-Chyurn

  • Author_Institution
    Inst. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2012
  • fDate
    17-19 June 2012
  • Firstpage
    355
  • Lastpage
    358
  • Abstract
    The impact of narrow width effects on high frequency performance parameters like fT, fMAX, and RF noise in 35nm multi-finger n-MOSFETs is investigated in this paper. Multi-OD devices with extremely narrow width and fixed finger number (NF) reveal higher Rg and Cgg, which lead to the penalty in fT, fMAX, and NFmin. On the other hand, narrow-OD MOSFET with larger NF can yield lower Rg and higher fMAX. However, these narrow-OD devices even with lower Rg suffer lower fT and higher NFmin. The mechanisms responsible for narrow width effects on fT, fMAX, and noise parameters will be addressed to provide an important guideline of MOSFET layout for RF circuits design using nanoscale CMOS technology.
  • Keywords
    CMOS integrated circuits; MOSFET; nanoelectronics; radiofrequency integrated circuits; MOSFET layout; RF circuits design; fMAX; fixed finger number; high frequency performance parameters; multiOD devices; multifinger n-MOSFET; nanoscale CMOS technology; narrow width effects; narrow-OD MOSFET; narrow-OD devices; noise parameters; size 35 nm; Degradation; MOS devices; MOSFET circuits; Noise; Noise measurement; Radio frequency; Standards; NFmin; Nanoscale CMOS; fMAX; fT; high frequency; multi-finger; narrow width;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE
  • Conference_Location
    Montreal, QC
  • ISSN
    1529-2517
  • Print_ISBN
    978-1-4673-0413-9
  • Electronic_ISBN
    1529-2517
  • Type

    conf

  • DOI
    10.1109/RFIC.2012.6242298
  • Filename
    6242298