DocumentCode
2642355
Title
The impact of narrow width effects on high frequency performance and noise in 35nm multi-finger n-MOSFETs
Author
Yeh, Kuo-Liang ; Chang, Chih-Shiang ; Guo, Jyh-Chyurn
Author_Institution
Inst. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
fYear
2012
fDate
17-19 June 2012
Firstpage
355
Lastpage
358
Abstract
The impact of narrow width effects on high frequency performance parameters like fT, fMAX, and RF noise in 35nm multi-finger n-MOSFETs is investigated in this paper. Multi-OD devices with extremely narrow width and fixed finger number (NF) reveal higher Rg and Cgg, which lead to the penalty in fT, fMAX, and NFmin. On the other hand, narrow-OD MOSFET with larger NF can yield lower Rg and higher fMAX. However, these narrow-OD devices even with lower Rg suffer lower fT and higher NFmin. The mechanisms responsible for narrow width effects on fT, fMAX, and noise parameters will be addressed to provide an important guideline of MOSFET layout for RF circuits design using nanoscale CMOS technology.
Keywords
CMOS integrated circuits; MOSFET; nanoelectronics; radiofrequency integrated circuits; MOSFET layout; RF circuits design; fMAX; fixed finger number; high frequency performance parameters; multiOD devices; multifinger n-MOSFET; nanoscale CMOS technology; narrow width effects; narrow-OD MOSFET; narrow-OD devices; noise parameters; size 35 nm; Degradation; MOS devices; MOSFET circuits; Noise; Noise measurement; Radio frequency; Standards; NFmin ; Nanoscale CMOS; fMAX ; fT ; high frequency; multi-finger; narrow width;
fLanguage
English
Publisher
ieee
Conference_Titel
Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE
Conference_Location
Montreal, QC
ISSN
1529-2517
Print_ISBN
978-1-4673-0413-9
Electronic_ISBN
1529-2517
Type
conf
DOI
10.1109/RFIC.2012.6242298
Filename
6242298
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