DocumentCode :
2650616
Title :
Performance measurements for an MBE-ECR plasma and free radical source
Author :
SRIVASTAVA, ANURAG K. ; Asmusen
Author_Institution :
Michigan State University
fYear :
1993
fDate :
1-3 June 1993
Firstpage :
116
Lastpage :
116
Keywords :
Atomic layer deposition; Cathodes; Electron emission; Heating; Ionization; Molecular beam epitaxial growth; Plasma materials processing; Plasma measurements; Plasma sources; Surface contamination;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
Type :
conf
DOI :
10.1109/PLASMA.1992.697833
Filename :
697833
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2650616
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