Title :
Characterization Of Dry Etch Induced In Ill/V Micro-structures
Author_Institution :
IBM Research Division, Zurich Research Laboratory
fDate :
29 Jul-2 Aug 1991
Keywords :
Argon; Dry etching; Geometrical optics; Ion beams; Surface emitting lasers; Wet etching;
Conference_Titel :
Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on
Print_ISBN :
0-87942-618-7
DOI :
10.1109/LEOSST.1991.639005
