2651268

In-situ CI₂ Thermal Etching Of GaAs/AiGaAs For Damage Removal In A Plasma Etcher

Lechaton, J.S. ; Buchmann, P. ; Dietrich, H.-P. ; Sasso, G. ; Vettiger, P. ; Webb, D.J.

IBM Research Division

1991

29 Jul-2 Aug 1991

37

38

Dry etching; Gallium arsenide; Mirrors; Optical waveguides; Plasma applications; Plasma devices; Plasma materials processing; Plasma temperature; Plasma waves; Sputter etching;

English

ieee

Epitaxial Materials and In-Situ Processing for Optoelectronic Devices, 1991/Microfabrication for Photonics and Optoelectronics, 1991. LEOS 1991 Summer Topical Meetings on

0-87942-618-7

conf

10.1109/LEOSST.1991.639007

639007