DocumentCode :
2653037
Title :
Characterization of active channel processing by PIMR
Author :
Heimlich, M.C. ; Gutmann, R.J. ; Kerber, L. ; Moreau, S. ; Vaughan, J.
Author_Institution :
Rensselaer Polytechnic Institute, Troy, NY
fYear :
1992
fDate :
21-24 Apr 1992
Firstpage :
291
Lastpage :
298
Keywords :
Annealing; Boron; Capacitance-voltage characteristics; Furnaces; Gallium arsenide; Implants; Ion implantation; MESFETs; Photoconductivity; Pulse measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semi-Insulating III-V Materials, 1992 Proceedings of the 7th Conference on
Print_ISBN :
0-7503-0242-9
Type :
conf
DOI :
10.1109/SIM.1992.752714
Filename :
752714
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2653037
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