DocumentCode :
2653084
Title :
High Frequency Performance of Implanted Si-MOSFETs
Author :
Tsironis, C. ; Niggebrugge, U.
fYear :
1979
fDate :
April 30 1979-May 2 1979
Firstpage :
396
Lastpage :
398
Abstract :
Silicon MOSFETs with a 0.8/um long channel, made by conventional technology and optimized for microwave applications, have noise figure of 3.5 dB at 4 GHz and f/sub max/ of 10 to 12 GHz. The noise and RF small signal performance are very slightly affected by channel ion implantation, used to shift the threshold voltage to positive values. The RF equivalent circuit analysis indicates negligible parasitic lead resistances but high feedback capacitance.
Keywords :
Circuit noise; Equivalent circuits; Ion implantation; MOSFETs; Microwave technology; Noise figure; RF signals; Radio frequency; Silicon; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest, 1979 IEEE MTT-S International
Conference_Location :
Orlando, FL, USA
Type :
conf
DOI :
10.1109/MWSYM.1979.1124080
Filename :
1124080
Link To Document :
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