Title :
High Frequency Performance of Implanted Si-MOSFETs
Author :
Tsironis, C. ; Niggebrugge, U.
fDate :
April 30 1979-May 2 1979
Abstract :
Silicon MOSFETs with a 0.8/um long channel, made by conventional technology and optimized for microwave applications, have noise figure of 3.5 dB at 4 GHz and f/sub max/ of 10 to 12 GHz. The noise and RF small signal performance are very slightly affected by channel ion implantation, used to shift the threshold voltage to positive values. The RF equivalent circuit analysis indicates negligible parasitic lead resistances but high feedback capacitance.
Keywords :
Circuit noise; Equivalent circuits; Ion implantation; MOSFETs; Microwave technology; Noise figure; RF signals; Radio frequency; Silicon; Threshold voltage;
Conference_Titel :
Microwave Symposium Digest, 1979 IEEE MTT-S International
Conference_Location :
Orlando, FL, USA
DOI :
10.1109/MWSYM.1979.1124080