• DocumentCode
    2654469
  • Title

    Radiation pattern conforming in UWB monopole antenna by means of dielectric coating profile optimization

  • Author

    Martinez-Fernandez, Jose ; Gil, Jose M. ; Zapata, Juan

  • Author_Institution
    Dipt. Electromagnetismo y Teor. de Circuitos, Univ. Politec. de Madrid, Madrid, Spain
  • fYear
    2009
  • fDate
    1-5 June 2009
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this work, a specific type of UWB monopole antenna is presented. This type of antenna makes use of a dielectric coating for the monopole which is used both as a radome and to configure the radiation characteristics of the antenna itself. Making use of a dielectric material with a relatively high dielectric constant but easy to work with (for manufacturing purposes), fields radiated from the monopole can be focused as in the case of a lens. In order to satisfy previously defined criteria, the profile of this dielectric coating must be conformed so that fields are focused in a proper way. To make this possible, a global optimization of the profile of the dielectric using the simulated annealing algorithm and the finite element method as the analysis technique is performed. In order to minimize losses as well, not only the profile of the dielectric coating but also the profile of the monopole itself would be subject of the global optimization.
  • Keywords
    antenna radiation patterns; coatings; dielectric materials; finite element analysis; monopole antennas; simulated annealing; ultra wideband antennas; UWB monopole antenna; dielectric coating profile optimization; dielectric material; finite element method; global optimization; radiation pattern conforming; simulated annealing algorithm; Analytical models; Antenna radiation patterns; Coatings; Dielectric losses; Dielectric materials; High-K gate dielectrics; Lenses; Manufacturing; Optimization methods; Ultra wideband antennas;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Antennas and Propagation Society International Symposium, 2009. APSURSI '09. IEEE
  • Conference_Location
    Charleston, SC
  • ISSN
    1522-3965
  • Print_ISBN
    978-1-4244-3647-7
  • Type

    conf

  • DOI
    10.1109/APS.2009.5172120
  • Filename
    5172120