Title :
The Spherical Pinch As A Soft X-ray Source For microlithography And Other Industrial Applications
Author :
Aithal, Sachin ; Lamari, Moktar ; Panarella, E.
Author_Institution :
Advanced Law and Fusion Technology, Inc.
Keywords :
Lightning; Magnetic confinement; Plasma confinement; Plasma properties; Plasma sources; Plasma x-ray sources; Production; Radiography; Voltage; X-ray imaging;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.697951
