Title :
Surface functionalization and monolayer formation on silicon resonant nanoballances
Author :
Tousifar, Babak ; Pourkamali, Siavash ; Kvasnica, Miroslav ; Purse, Byron
Author_Institution :
Dept. of Mech. & Mater. Eng., Univ. of Denver, Denver, CO, USA
Abstract :
This work presents formation of molecular monolayers on silicon surfaces of micromechanical resonant devices and measurement of the mass of the deposited monolayer using such. Thermally actuated single crystalline silicon micromechanical resonators with resonant frequencies in the 20-30 MHz range were used as highly sensitive mass sensors. Monolayers of long chain amine molecules were formed by reacting the amine groups with epoxide groups covalently bonded to the silicon surfaces. As a result a consistent negative frequency shift of ~100ppm was measured for the resonators. Mass calculations based on the measured frequency shift show a 6.9% surface coverage for the monolayer. XPS surface analysis shows existence of nitrogen atoms on the resonator surface confirming that the measured frequency shifts are due to the addition of the amine molecules.
Keywords :
X-ray photoelectron spectra; elemental semiconductors; mass measurement; micromechanical resonators; microsensors; monolayers; nanosensors; silicon; Si; XPS surface analysis; epoxide group; frequency shift measurement; highly sensitive mass sensor; long chain amine molecule; mass calculation; molecular monolayer; monolayer formation; negative frequency shift; resonator surface; silicon resonant nanoballance; surface functionalization; thermally actuated single crystalline silicon micromechanical resonator device; Biomedical measurements; Frequency measurement; Pollution measurement; Resonant frequency; Silicon; Surface contamination; Surface treatment;
Conference_Titel :
Frequency Control and the European Frequency and Time Forum (FCS), 2011 Joint Conference of the IEEE International
Conference_Location :
San Fransisco, CA
Print_ISBN :
978-1-61284-111-3
DOI :
10.1109/FCS.2011.5977888