Title :
Outgassing of quartz
Author :
Pierce, D.E. ; Murray, R.A. ; Lareau, R. ; Laffey, S. ; Vig, J.R.
Author_Institution :
US Army Res. Lab., Fort Monmouth, NJ, USA
Abstract :
The outgassing of quartz crystal plates was measured with a high resolution mass spectrometer using thermal desorption techniques. As the quartz was heated from 40°C to 1200°C in a vacuum, the mass spectrometer identified several types of gases. The primary species that appeared were NH3, OH, and H2O. The bonding sites of the OH and H2O are discussed, including the temperature dependence of the desorption peaks which is used to calculate the activation energies of the surface states. Bakeout times and temperatures to insure clean surfaces are calculated. The effect of bakeout conditions on aging is also discussed. The presence of NH3 was unexpected, but it is believed that the NH3 was due to the sample preparation which included etching the samples in ammonium bifluoride
Keywords :
ammonia; crystal resonators; desorption; hydrogen compounds; mass spectroscopic chemical analysis; mass spectroscopy; surface states; H2O; NH3; OH; activation energies; aging; ammonium bifluoride; bakeout times; bonding sites; clean surfaces; desorption peaks; etching; high resolution mass spectrometer; laser heating; outgassing; quartz crystal plates; sample preparation; surface states; temperature dependence; thermal desorption; Aging; Crystals; Electrodes; Heating; Hydrogen; Impurities; Mass spectroscopy; Punching; Surface cleaning; Temperature;
Conference_Titel :
Frequency Control Symposium, 1994. 48th., Proceedings of the 1994 IEEE International
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-1945-1
DOI :
10.1109/FREQ.1994.398348
