DocumentCode :
2670728
Title :
THz transmission spectroscopy to study the oxidation kinetics of nanometer thick copper films
Author :
Ramanandan, K.P.G. ; Planken, Paul C M
Author_Institution :
Fac. of Appl. Sci., Delft Univ. of Technol., Delft, Netherlands
fYear :
2011
fDate :
2-7 Oct. 2011
Firstpage :
1
Lastpage :
2
Abstract :
We present a new non-contact method for in-situ monitoring of oxidation of nanometer thick copper films using THz - time domain spectroscopy. The transmission of THz pulses through copper films during oxidation at temperatures around 140°C is measured in ambient air.
Keywords :
copper; nanostructured materials; oxidation; reaction kinetics; terahertz spectroscopy; terahertz wave spectra; thin films; time-domain analysis; THz pulses; THz transmission spectroscopy; in-situ monitoring; nanometer thick copper films; noncontact method; oxidation kinetics; time domain spectroscopy; Copper; Films; Oxidation; Silicon; Spectroscopy; Temperature measurement; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Infrared, Millimeter and Terahertz Waves (IRMMW-THz), 2011 36th International Conference on
Conference_Location :
Houston, TX
ISSN :
2162-2027
Print_ISBN :
978-1-4577-0510-6
Electronic_ISBN :
2162-2027
Type :
conf
DOI :
10.1109/irmmw-THz.2011.6104811
Filename :
6104811
Link To Document :
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