Title :
Characterization of a planar RF induction plasma source for polymer film deposition processes
Author :
Mahoney, L.J. ; Shohet, J.L. ; Wendt, A.E.
Author_Institution :
University of Wisconsin
Keywords :
Fault location; Fluctuations; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Plasma sources; Plasma temperature; Polymer films; Radio frequency;
Conference_Titel :
Plasma Science,1992. IEEE Conference Record - Abstracts., 1992 IEEE International Conference on
Conference_Location :
Tampa, FL, USA
Print_ISBN :
0-7803-0716-X
DOI :
10.1109/PLASMA.1992.698001
